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Class 216: ETCHING A SUBSTRATE: PROCESSES / U.S. Patent Classification Definitions (7691 words) |
 | Class 216 also provides for the original classification when the claims are alternative (claims to a Class 216 process and claims to a Class 205 electrolytic etching, or when a generic claim is present and no species is specifically claimed). |
| Class 216 provides for the use of a cold plasma which is a chemical etching process involving reactive ions and a substrate whereas the high temperature thermal plasma proper for Class 219 alters the substrate solely by thermal means. |
| Class 216 is proper for a nominal etching process when the etching composition is not claimed. |
| COMTEK Communications Technology, Inc. / AT-216 (836 words) |
| The AT-216 system functions as a remote microphone for the user, overcoming the greatest listening challenges for those with impaired hearing: high levels of background noise, reverberation effects, and distance between the speaker and listener. |
| The AT-216 system not only works on the standard channels (1-40) in the 216 MHz band maintaining compatibility with other brands, but only COMTEK's AT-216 works with the high dynamic range companded channels (41-60) for high fidelity sound reproduction rendering greater speech intelligibility. |
| The AT-216 system has unique power conservation circuitry which allows a nine volt battery to be used with greater efficiency. |
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